THERMAL-CONVERSION OF N-TYPE GAAS-SI TO P-TYPE IN EXCESS ARSENIC VAPOR

被引:17
作者
KY, NH [1 ]
PAVESI, L [1 ]
ARAUJO, D [1 ]
GANIERE, JD [1 ]
REINHART, FK [1 ]
机构
[1] UNIV TRENTO,DEPT PHYS,I-38050 TRENT,ITALY
关键词
D O I
10.1063/1.349196
中图分类号
O59 [应用物理学];
学科分类号
摘要
Annealing in excess arsenic vapor at 650-degrees-C introduces thermal conversion of n-type Si-doped GaAs samples (n = 1.3 X 10(18) cm-3) into p type. The observations are made by current-voltage and electron-beam induced current measurements. The donor concentration on the n side near the junction decreases after annealing. We present a comparison between the photoluminescence spectra of samples annealed under different conditions and an analysis of depth profile of the photoluminescence spectra. Our results underline the important role of gallium vacancies and gallium vacancy-silicon donor complex in the thermal conversion.
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页码:3887 / 3891
页数:5
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