ION-IMPLANTATION IN TUNGSTEN LAYERS

被引：1

作者：

HARA, T

CHEN, SC

ANDO, H

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1987年 / 134卷 / 12期

关键词：

D O I：

10.1149/1.2100357

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：3139 / 3142

页数：4

共 18 条

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[8]

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JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1986, 133 (12) :2555-2559

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