A NEW SELF-LIMITING PROCESS FOR THE PRODUCTION OF THIN SUB-MICRON SEMICONDUCTOR-FILMS

被引：9

作者：

LEE, KC ^{[1
]}

SILCOX, J ^{[1
]}

LEE, CA ^{[1
]}

机构：

[1] CORNELL UNIV, SCH APPL & ENGN PHYS, ITHACA, NY 14853 USA

来源：

JOURNAL OF APPLIED PHYSICS | 1983年 / 54卷 / 07期

关键词：

D O I：

10.1063/1.332585

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4035 / 4037

页数：3

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