FORMATION OF MICROGRATINGS FOR III-V-SEMICONDUCTOR INTEGRATED OPTOELECTRONICS BY HIGH-VOLTAGE ELECTRON-BEAM LITHOGRAPHY

被引:2
作者
MCINERNEY, J [1 ]
FICE, MJ [1 ]
AHMED, H [1 ]
机构
[1] UNIV CAMBRIDGE,CAVENDISH LAB,DEPT PHYS,MICROELECTR RES GRP,CAMBRIDGE CB3 0HE,ENGLAND
关键词
D O I
10.1109/JLT.1986.1074657
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:1494 / 1501
页数:8
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