RAPID THERMAL ANNEALING OF SHALLOW SB-IMPLANTED SI

被引:3
作者
RIDGWAY, MC
WHITTON, JL
SCANLON, PJ
NAEM, AA
机构
[1] QUEENS UNIV,DEPT PHYS,KINGSTON K7L 3N6,ONTARIO,CANADA
[2] NO TELECOM ELECTR LTD,OTTAWA,ONTARIO,CANADA
关键词
D O I
10.1063/1.341478
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
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页码:3456 / 3460
页数:5
相关论文
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