SURFACE-CHEMISTRY OF HF PASSIVATED SILICON - X-RAY PHOTOELECTRON AND ION-SCATTERING SPECTROSCOPY RESULTS

被引：136

作者：

WEINBERGER, BR

PETERSON, GG

ESCHRICH, TC

KRASINSKI, HA

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1986年 / 60卷 / 09期

关键词：

D O I：

10.1063/1.337743

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：3232 / 3234

页数：3

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