MICROWAVE-EXCITED PLASMA CVD OF A-SI-H FILMS UTILIZING A HYDROGEN PLASMA STREAM OR BY DIRECT EXCITATION OF SILANE

被引：21

作者：

WATANABE, T

TANAKA, M

AZUMA, K

NAKATANI, M

SONOBE, T

SHIMADA, T

机构：

[1] HITACHI LTD,HITACHI WORKS,HITACHI,IBARAKI 317,JAPAN

[2] HITACHI LTD,CENT RES LAB,KOKUBUNJI,TOKYO 185,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1987年 / 26卷 / 08期

关键词：

D O I：

10.1143/JJAP.26.1215

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1215 / 1218

页数：4

共 14 条

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