RELATIONSHIP BETWEEN ELECTRON SENSITIVITY AND CHEMICAL STRUCTURES OF POLYMERS AS EB RESISTS .3. ELECTRON SENSITIVITY OF VARIOUS POLYAMIDES USING 3-AMINO PERHYDROAZEPINE

被引：1

作者：

OGUCHI, K ^{[1
]}

SANUI, K ^{[1
]}

OGATA, N ^{[1
]}

TAKAHASHI, Y ^{[1
]}

NAKADA, T ^{[1
]}

机构：

[1] DAI NIPPON PRINTING CO LTD,KAMIFUKUOKA,SAITAMA 356,JAPAN

来源：

JOURNAL OF APPLIED POLYMER SCIENCE | 1984年 / 29卷 / 12期

关键词：

D O I：

10.1002/app.1984.070291263

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

引用

页码：4341 / 4351

页数：11

共 10 条

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[7] IODINATED POLYSTYRENE - AN ION-MILLABLE NEGATIVE RESIST [J].

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[8] PGMA AS A HIGH-RESOLUTION, HIGH-SENSITIVITY NEGATIVE ELECTRON-BEAM RESIST [J].

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[9] MOLECULAR PARAMETERS AND LITHOGRAPHIC PERFORMANCE OF POLY(GLYCIDYL METHACRYLATE-CO-ETHYL ACRYLATE) - NEGATIVE ELECTRON RESIST [J].

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