DEFECT EVALUATION OF SI MBE FILM

被引：11

作者：

OTA, Y

机构：

来源：

JOURNAL OF CRYSTAL GROWTH | 1983年 / 61卷 / 03期

关键词：

D O I：

10.1016/0022-0248(83)90172-0

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

引用

页码：439 / 448

页数：10

共 39 条

[1]

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OTA, Y .

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[9] SILICON HOMOEPITAXIAL THIN-FILMS VIA SILANE PYROLYSIS - HEED AND AUGER-ELECTRON SPECTROSCOPY STUDY [J].

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[10] FORMATION OF STACKING-FAULTS AND ENHANCED DIFFUSION IN OXIDATION OF SILICON [J].

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