Index-guided self-aligned InGaAs/GaAs/InGaP quantum well lasers are fabricated by gas-source molecular beam epitaxy in two growth sequences on a GaAs substrate for the first time. The use of aluminum-free InGaP as cladding layers permits regrowth steps without the problem with the oxidation of aluminum alloys. A patterned n-InGaP current confinement layer is used to provide index guiding as well as current blocking. Preliminary results from coated 2.5-mu-m-wide and 508-mu-m-long devices show a room temperature continuous wave lasing threshold current of 12 mA with an external differential quantum efficiency of 0.68 mW/mA and a characteristic temperature of 130 K from 30 to 75-degrees-C.