NITRIDE FILM FORMATION BY ION AND VAPOR-DEPOSITION

被引:45
作者
SATOU, M
YAMAGUCHI, K
ANDOH, Y
SUZUKI, Y
MATSUDA, K
FUJIMOTO, F
机构
[1] UNIV TOKYO,COLL GEN EDUC,TOKYO 153,JAPAN
[2] KYOCERA CORP,CENT RES LAB,KAGOSHIMA 89943,JAPAN
[3] NISSIN ELECT CO LTD,KYOTO 615,JAPAN
关键词
D O I
10.1016/0168-583X(85)90493-8
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
引用
收藏
页码:910 / 914
页数:5
相关论文
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