FREQUENCY-EFFECTS IN PLASMA-ETCHING

[11] BROWN SC, 1966, INTRO ELECTRICAL DIS, P158

[12] PROFILE CONTROL WITH DC BIAS IN PLASMA-ETCHING [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (02) : 393 - 396

[13] CHAMPION KSW, 1953, MIT31 RES LAB EL Q P

[14] Discharge from hot CaO. [J]. PHYSICAL REVIEW, 1911, 32 (05): : 0492 - 0511

[15] IONIC RECOMBINATION OF ATOMIC AND MOLECULAR-IONS IN FLOWING AFTERGLOW PLASMAS [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1978, 11 (16) : 2199 - 2206

[16] ELECTRIC ACTIVATION OF CHEMICAL REACTIONS [J]. TRANSACTIONS OF THE ELECTROCHEMICAL SOCIETY, 1947, 91 : 407 - 417

[17] EVIDENCE FOR A TIME-DEPENDENT EXCITATION PROCESS IN SILANE RADIO-FREQUENCY GLOW-DISCHARGES [J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (05) : 2272 - 2275

[18] LASER DIAGNOSTICS OF PLASMA-ETCHING - MEASUREMENT OF CL2+ IN A CHLORINE DISCHARGE [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (03): : 817 - 823

[19] EFFECTS OF FREQUENCY ON OPTICAL-EMISSION, ELECTRICAL, ION, AND ETCHING CHARACTERISTICS OF A RADIO-FREQUENCY CHLORINE PLASMA [J]. JOURNAL OF APPLIED PHYSICS, 1985, 58 (06) : 2135 - 2144

[20] DONNELLY VM, 1984, ION BOMBARDMENT MOFI, P323

[11] BROWN SC, 1966, INTRO ELECTRICAL DIS, P158

[12] PROFILE CONTROL WITH DC BIAS IN PLASMA-ETCHING [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (02) : 393 - 396

[13] CHAMPION KSW, 1953, MIT31 RES LAB EL Q P

[14] Discharge from hot CaO. [J]. PHYSICAL REVIEW, 1911, 32 (05): : 0492 - 0511

[15] IONIC RECOMBINATION OF ATOMIC AND MOLECULAR-IONS IN FLOWING AFTERGLOW PLASMAS [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1978, 11 (16) : 2199 - 2206

[16] ELECTRIC ACTIVATION OF CHEMICAL REACTIONS [J]. TRANSACTIONS OF THE ELECTROCHEMICAL SOCIETY, 1947, 91 : 407 - 417

[17] EVIDENCE FOR A TIME-DEPENDENT EXCITATION PROCESS IN SILANE RADIO-FREQUENCY GLOW-DISCHARGES [J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (05) : 2272 - 2275

[18] LASER DIAGNOSTICS OF PLASMA-ETCHING - MEASUREMENT OF CL2+ IN A CHLORINE DISCHARGE [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (03): : 817 - 823

[19] EFFECTS OF FREQUENCY ON OPTICAL-EMISSION, ELECTRICAL, ION, AND ETCHING CHARACTERISTICS OF A RADIO-FREQUENCY CHLORINE PLASMA [J]. JOURNAL OF APPLIED PHYSICS, 1985, 58 (06) : 2135 - 2144

[20] DONNELLY VM, 1984, ION BOMBARDMENT MOFI, P323