ELECTROMIGRATION IN AL-CU THIN-FILMS WITH POLYIMIDE PASSIVATION

被引:17
作者
LLOYD, JR
机构
关键词
D O I
10.1016/0040-6090(82)90431-X
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:175 / 182
页数:8
相关论文
共 9 条
[1]   COATING, MECHANICAL CONSTRAINTS, AND PRESSURE EFFECTS ON ELECTROMIGRATION [J].
AINSLIE, NG ;
WELLS, OC ;
DHEURLE, FM .
APPLIED PHYSICS LETTERS, 1972, 20 (04) :173-&
[2]   ELECTROMIGRATION-INDUCED FAILURES IN ALUMINUM FILM CONDUCTORS [J].
BLAIR, JC ;
GHATE, PB ;
HAYWOOD, CT .
APPLIED PHYSICS LETTERS, 1970, 17 (07) :281-&
[3]   MEASUREMENT OF STRESS GRADIENTS GENERATED BY ELECTROMIGRATION [J].
BLECH, IA ;
TAI, KL .
APPLIED PHYSICS LETTERS, 1977, 30 (08) :387-389
[4]   ELECTROMIGRATION IN THIN ALUMINUM FILMS ON TITANIUM NITRIDE [J].
BLECH, IA .
JOURNAL OF APPLIED PHYSICS, 1976, 47 (04) :1203-1208
[5]  
BLECH IA, 1976, APPL PHYS LETT, V29, P1931
[6]   EFFECT OF STRUCTURE AND PROCESSING ON ELECTROMIGRATION-INDUCED FAILURE IN ANODIZED ALUMINUM [J].
LEARN, AJ .
JOURNAL OF APPLIED PHYSICS, 1973, 44 (03) :1251-1258
[7]   GRAIN-BOUNDARY AND VACANCY DIFFUSION-MODEL FOR ELECTROMIGRATION-INDUCED DAMAGE IN THIN-FILM CONDUCTORS [J].
LLOYD, JR ;
NAKAHARA, S .
THIN SOLID FILMS, 1980, 72 (03) :451-456
[8]   EFFECTS OF DIELECTRIC OVERCOATING ON ELECTROMIGRATION IN ALUMINUM INTERCONNECTIONS [J].
SPITZER, SM ;
SCHWARTZ, S .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1969, ED16 (04) :348-&
[9]  
1976, MODERN PLASTIC ENCY, V53