PLASMA-ASSISTED ETCHING MECHANISMS - THE IMPLICATIONS OF REACTION PROBABILITY AND HALOGEN COVERAGE

[11] DONNELLY VM, 1981, SOLID STATE TECHNOL, V24, P161

[12] Flamm D.L., 1981, PLASMA CHEM PLASMA P, V1, P317, DOI [10.1007/bf00565992, DOI 10.1007/BF00565992]

[13] THE REACTION OF FLUORINE-ATOMS WITH SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (05) : 3633 - 3639

[14] FLAMM DL, 1983, SOLID STATE TECHNOL, V26, P117

[15] ION-ENHANCED GAS-SURFACE CHEMISTRY - THE INFLUENCE OF THE MASS OF THE INCIDENT ION [J]. SURFACE SCIENCE, 1981, 103 (01) : 177 - 188

[16] ION ENHANCED GAS-SURFACE REACTIONS - A KINETIC-MODEL FOR THE ETCHING MECHANISM [J]. SURFACE SCIENCE, 1981, 103 (2-3) : 524 - 534

[17] MASS AND ENERGY-DISTRIBUTION OF PARTICLES SPUTTER ETCHED FROM SI IN A XEF2 ENVIRONMENT [J]. APPLIED PHYSICS LETTERS, 1982, 41 (02) : 174 - 176

[18] CHEMICAL SPUTTERING OF GRAPHITE IN AN OXYGEN PLASMA [J]. VACUUM, 1976, 26 (02) : 53 - 60

[19] Hosokawa N, 1974, JPN J APPL PHYS S, V13, P435

[20] PHOTOEFFECTS ON THE FLUORINATION OF SILICON .2. KINETICS OF THE INITIAL RESPONSE TO LIGHT [J]. JOURNAL OF CHEMICAL PHYSICS, 1984, 80 (10) : 4851 - 4858

[11] DONNELLY VM, 1981, SOLID STATE TECHNOL, V24, P161

[12] Flamm D.L., 1981, PLASMA CHEM PLASMA P, V1, P317, DOI [10.1007/bf00565992, DOI 10.1007/BF00565992]

[13] THE REACTION OF FLUORINE-ATOMS WITH SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (05) : 3633 - 3639

[14] FLAMM DL, 1983, SOLID STATE TECHNOL, V26, P117

[15] ION-ENHANCED GAS-SURFACE CHEMISTRY - THE INFLUENCE OF THE MASS OF THE INCIDENT ION [J]. SURFACE SCIENCE, 1981, 103 (01) : 177 - 188

[16] ION ENHANCED GAS-SURFACE REACTIONS - A KINETIC-MODEL FOR THE ETCHING MECHANISM [J]. SURFACE SCIENCE, 1981, 103 (2-3) : 524 - 534

[17] MASS AND ENERGY-DISTRIBUTION OF PARTICLES SPUTTER ETCHED FROM SI IN A XEF2 ENVIRONMENT [J]. APPLIED PHYSICS LETTERS, 1982, 41 (02) : 174 - 176

[18] CHEMICAL SPUTTERING OF GRAPHITE IN AN OXYGEN PLASMA [J]. VACUUM, 1976, 26 (02) : 53 - 60

[19] Hosokawa N, 1974, JPN J APPL PHYS S, V13, P435

[20] PHOTOEFFECTS ON THE FLUORINATION OF SILICON .2. KINETICS OF THE INITIAL RESPONSE TO LIGHT [J]. JOURNAL OF CHEMICAL PHYSICS, 1984, 80 (10) : 4851 - 4858