PLASMA-ASSISTED ETCHING MECHANISMS - THE IMPLICATIONS OF REACTION PROBABILITY AND HALOGEN COVERAGE

被引：120

作者：

WINTERS, HF

COBURN, JW

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1985年 / 3卷 / 05期

关键词：

D O I：

10.1116/1.582996

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1376 / 1383

页数：8

共 38 条

[31] CHEMICAL SPUTTERING OF FLUORINATED SILICON
TU, YY
CHUANG, TJ
WINTERS, HF
[J]. PHYSICAL REVIEW B, 1981, 23 (02): : 823 - 835
[32] RF INDUCTION TECHNIQUE FOR SAMPLE HEATING IN SURFACE SCIENCE EXPERIMENTS
WINTERS, HF
SCHLAEGEL, J
HORNE, D
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (04): : 1605 - 1608
[33] ROLE OF CHEMISORPTION IN PLASMA ETCHING
WINTERS, HF
[J]. JOURNAL OF APPLIED PHYSICS, 1978, 49 (10) : 5165 - 5170
[34] ETCHING OF SILICON WITH XEF2 VAPOR
WINTERS, HF
COBURN, JW
[J]. APPLIED PHYSICS LETTERS, 1979, 34 (01) : 70 - 73
[35] SURFACE PROCESSES IN PLASMA-ASSISTED ETCHING ENVIRONMENTS
WINTERS, HF
COBURN, JW
CHUANG, TJ
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (02): : 469 - 480
[36] ETCH PRODUCTS FROM THE REACTION ON CL-2 WITH AL(100) AND CU(100) AND XEF2 WITH W(111) AND NB
WINTERS, HF
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01): : 9 - 15
[37] THE ETCHING OF CU(100) WITH CL-2
WINTERS, HF
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (03): : 786 - 790
[38] THE ETCHING OF W(111) WITH XEF2
WINTERS, HF
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (03): : 700 - 704