DRY CLEANING OF CONTACT HOLES USING ULTRAVIOLET (UV) GENERATED OZONE

被引：6

作者：

NORSTROM, H

OSTLING, M

BUCHTA, R

PETERSSON, CS

机构：

[1] Inst of Microwave Technology, Stockholm, Swed, Inst of Microwave Technology, Stockholm, Swed

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1985年 / 132卷 / 09期

关键词：

DRY CLEANING OF CONTACT HOLES - ULTRAVIOLET (UV) GENERATED OZONE;

D O I：

10.1149/1.2114337

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2285 / 2287

页数：3

共 11 条

[1] PROPERTIES AND COATING RATES OF DIAMOND-LIKE CARBON-FILMS PRODUCED BY RF GLOW-DISCHARGE OF HYDROCARBON GASES [J].

ANDERSSON, LP ;

BERG, S ;

NORSTROM, H ;

OLAISON, R ;

TOWTA, S .

THIN SOLID FILMS, 1979, 63 (01) :155-160

[2] DEPOSITION OF HARD AND INSULATING CARBONACEOUS FILMS ON AN RF TARGET IN A BUTANE PLASMA [J].

HOLLAND, L ;

OJHA, SM .

THIN SOLID FILMS, 1976, 38 (02) :L17-L19

[3]

KERN W, 1970, RCA REV, V31, P187

[4] SURFACE CLEANING IN THIN-FILM TECHNOLOGY [J].

MATTOX, DM .

THIN SOLID FILMS, 1978, 53 (01) :81-96

[5] UV-OZONE CLEANING OF GAAS FOR MBE [J].

MCCLINTOCK, JA ;

WILSON, RA ;

BYER, NE .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (02) :241-242

[6] RIE OF SIO2 IN DOPED AND UNDOPED FLUOROCARBON PLASMAS [J].

NORSTROM, H ;

BUCHTA, R ;

RUNOVC, F ;

WIKLUND, P .

VACUUM, 1982, 32 (12) :737-745

[7] TISI2/TIN - A STABLE MULTILAYERED CONTACT STRUCTURE FOR SHALLOW IMPLANTED JUNCTIONS IN VLSI TECHNOLOGY [J].

NORSTROM, H ;

DONCHEV, T ;

OSTLING, M ;

PETERSSON, CS .

PHYSICA SCRIPTA, 1983, 28 (06) :633-636

[8] THE C-12(ALPHA,ALPHA)C-12 NUCLEAR-RESONANCE AT 4.26 MEV AND ITS APPLICATION IN RBS ANALYSIS OF CARBON CONTENT IN THIN-FILMS [J].

OSTLING, M ;

PETERSSON, CS ;

POSSNERT, G .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1983, 218 (1-3) :439-444

[9] SURFACE CLEANING BY ULTRAVIOLET-RADIATION [J].

SOWELL, RR ;

CUTHRELL, RE ;

MATTOX, DM ;

BLAND, RD .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (01) :474-475

[10]

VIG J, 1985, UNPUB J VAC SCI MAY

← 1 2 →