ELECTRONIC AND CHEMICAL-PROPERTIES OF HYDROGEN EXPOSED GAAS(100) AND (110) SURFACES STUDIED BY PHOTOEMISSION

被引：8

作者：

LANDESMAN, JP

MABON, R

ALLAN, G

LANNOO, M

PRIESTER, C

BONNET, JE

机构：

[1] INST SUPER ELECTR N,PHYS SOLIDES LAB,F-59046 LILLE,FRANCE

[2] UNIV PARIS 11,UTILISAT RAYONNEMENT ELECTROMAGNET LAB,F-91405 ORSAY,FRANCE

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1989年 / 7卷 / 04期

关键词：

D O I：

10.1116/1.584618

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：882 / 887

页数：6

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