A SELF-ALIGNED COBALT SILICIDE TECHNOLOGY USING RAPID THERMAL-PROCESSING

被引:83
作者
VANDENHOVE, L
WOLTERS, R
MAEX, K
DEKEERSMAECKER, R
DECLERCK, G
机构
[1] IMEC LAB,B-3030 LEUVEN,BELGIUM
[2] PHILIPS RES LABS,5600 JA EINDHOVEN,NETHERLANDS
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1986年 / 4卷 / 06期
关键词
D O I
10.1116/1.583458
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:1358 / 1363
页数:6
相关论文
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