PLASMA PARAMETER-ESTIMATION FROM RF IMPEDANCE MEASUREMENTS IN A DRY ETCHING SYSTEM

被引：55

作者：

VANROOSMALEN, AJ

机构：

来源：

APPLIED PHYSICS LETTERS | 1983年 / 42卷 / 05期

关键词：

D O I：

10.1063/1.93948

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：416 / 418

页数：3

共 14 条

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[10] A KINETIC-STUDY OF THE PLASMA-ETCHING PROCESS .2. PROBE MEASUREMENTS OF ELECTRON PROPERTIES IN AN RF PLASMA-ETCHING REACTOR [J].

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