MONOSILICON AND DISILICON RADICALS IN SILANE AND SILANE-ARGON DC DISCHARGES

被引：190

作者：

ROBERTSON, R

GALLAGHER, A

机构：

[1] UNIV COLORADO,JOINT INST LAB ASTROPHYS,BOULDER,CO 80309

[2] NBS,BOULDER,CO 80309

来源：

JOURNAL OF APPLIED PHYSICS | 1986年 / 59卷 / 10期

关键词：

D O I：

10.1063/1.336806

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：3402 / 3411

页数：10

相关论文

共 48 条

[31] DISSOCIATION CROSS-SECTIONS OF SILANE AND DISILANE BY ELECTRON-IMPACT
PERRIN, J
SCHMITT, JPM
DEROSNY, G
DREVILLON, B
HUC, J
LLORET, A
[J]. CHEMICAL PHYSICS, 1982, 73 (03) : 383 - 394
[32] EMISSION CROSS-SECTIONS FROM FRAGMENTS PRODUCED BY ELECTRON-IMPACT ON SILANE
PERRIN, J
SCHMITT, JPM
[J]. CHEMICAL PHYSICS, 1982, 67 (02) : 167 - 176
[33] AN ELECTRON IMPACT STUDY OF IONIZATION AND DISSOCIATION OF MONOSILANE AND DISILANE
POTZINGER, P
LAMPE, FW
[J]. JOURNAL OF PHYSICAL CHEMISTRY, 1969, 73 (11) : 3912 - +
[34] RADICAL SPECIES IN ARGON-SILANE DISCHARGES
ROBERTSON, R
HILS, D
CHATHAM, H
GALLAGHER, A
[J]. APPLIED PHYSICS LETTERS, 1983, 43 (06) : 544 - 546
[35] SILANE PYROLYSIS
ROBERTSON, R
HILS, D
GALLAGHER, A
[J]. CHEMICAL PHYSICS LETTERS, 1984, 103 (05) : 397 - 404
[36] ROBERTSON R, 1985, THESIS U COLORADO
[37] ROBERTSON RN, UNPUB
[38] SPATIAL CONCENTRATIONS OF SILICON ATOMS BY LASER-INDUCED FLUORESCENCE IN A SILANE GLOW-DISCHARGE
ROTH, RM
SPEARS, KG
WONG, G
[J]. APPLIED PHYSICS LETTERS, 1984, 45 (01) : 28 - 30
[39] PRODUCTION MECHANISM AND REACTIVITY OF THE SIH RADICAL IN A SILANE PLASMA
SCHMITT, JPM
GRESSIER, P
KRISHNAN, M
DEROSNY, G
PERRIN, J
[J]. CHEMICAL PHYSICS, 1984, 84 (02) : 281 - 293
[40] GROWTH AND DEFECT CHEMISTRY OF AMORPHOUS HYDROGENATED SILICON
SCOTT, BA
REIMER, JA
LONGEWAY, PA
[J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (12) : 6853 - 6863

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