SPATIAL CONCENTRATIONS OF SILICON ATOMS BY LASER-INDUCED FLUORESCENCE IN A SILANE GLOW-DISCHARGE

被引：65

作者：

ROTH, RM

SPEARS, KG

WONG, G

机构：

[1] NORTHWESTERN UNIV,DEPT CHEM,EVANSTON,IL 60201

[2] NORTHWESTERN UNIV,DEPT PHYS & ASTRON,EVANSTON,IL 60201

来源：

APPLIED PHYSICS LETTERS | 1984年 / 45卷 / 01期

关键词：

D O I：

10.1063/1.94992

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：28 / 30

页数：3

共 14 条

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[5] OPTICAL-EMISSION SPECTROSCOPY - TOWARD THE IDENTIFICATION OF SPECIES IN THE PLASMA DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON ALLOYS
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[J]. SOLAR CELLS, 1980, 2 (04): : 385 - 400
[6] HIGH-RESOLUTION ABSORPTION AND EMISSION-SPECTROSCOPY OF A SILANE PLASMA IN THE 1800-2300 CM-1 RANGE
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PERRIN, J
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[J]. JOURNAL OF CHEMICAL PHYSICS, 1982, 76 (07) : 3414 - 3421
[7] HYDROGEN IN AMORPHOUS-SEMICONDUCTORS
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[J]. CRC CRITICAL REVIEWS IN SOLID STATE AND MATERIALS SCIENCES, 1980, 9 (03): : 211 - 283
[8] KNIGHTS JC, 1976, AIP C P, V31, P296
[9] APPLICATION OF RF DISCHARGES TO SPUTTERING
KOENIG, HR
MAISSEL, LI
[J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1970, 14 (02) : 168 - &
[10] PLASMA SPECTROSCOPY GLOW-DISCHARGE DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON
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TANAKA, K
[J]. THIN SOLID FILMS, 1982, 92 (1-2) : 171 - 187

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