LASER-ASSISTED CVD OF AMORPHOUS MATERIALS

被引：9

作者：

GIANINONI, I

MUSCI, M

机构：

[1] CISE, SpA, Milan, Italy, CISE, SpA, Milan, Italy

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1985年 / 77-8卷

关键词：

D O I：

10.1016/0022-3093(85)90768-9

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

SEMICONDUCTING FILMS

引用

页码：743 / 752

页数：10

共 22 条

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[8]

EHRLICH DJ, 1984, APPL PHYS LETT, V44, P267, DOI 10.1063/1.94694

[9] LASER-INDUCED VAPOR-DEPOSITION OF SILICON [J].

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APPLIED PHYSICS LETTERS, 1979, 35 (08) :626-627

[10] PHOTOCHEMICAL VAPOR-DEPOSITION OF UNDOPED AND N-TYPE AMORPHOUS-SILICON FILMS PRODUCED FROM DISILANE [J].

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