RELATIONSHIPS BETWEEN THE PLASMA ENVIRONMENT AND THE COMPOSITION AND OPTICAL-PROPERTIES OF PLASMA-POLYMERIZED THIN-FILMS PRODUCED IN RF DISCHARGES OF C2H2-SF6 MIXTURES

被引:59
作者
DURRANT, SF [1 ]
MOTA, RP [1 ]
DEMORAES, MAB [1 ]
机构
[1] UNIV ESTADUAL PAULISTA,FEG,DEPT FIS & QUIM,BR-12500 GUARATINGUETA,SP,BRAZIL
关键词
D O I
10.1063/1.350676
中图分类号
O59 [应用物理学];
学科分类号
摘要
Polymer films were grown in rf discharges containing different proportions of C2H2 and SF6. Quantitative optical emission spectrometry (actinometry) was used to follow the trends in the plasma concentrations of the species H and F, and more tentatively, of CH, CF, and CF2, as a function of the feed composition. Infrared spectroscopy revealed the density of CH and CF bonds in the deposited material. As the partial pressure of SF6 in the feed was increased, the degree of fluorination of the polymer also rose. The form of the dependency of the deposition rate on the proportion of SF6 in the feed was in good qualitative agreement with the activated growth model. From transmission ultraviolet visible spectroscopy data the refractive index and the absorption coefficient of the polymers were calculated as a function of the deposition parameters. Since the optical gap depended to some extent upon the degree of fluorination, it could, within limits, be determined by a suitable choice of the proportion of SF6 in the feed. A qualitative explanation of this relationship is given.
引用
收藏
页码:448 / 455
页数:8
相关论文
共 32 条
[11]   HARD CARBON COATINGS WITH LOW OPTICAL-ABSORPTION [J].
DISCHLER, B ;
BUBENZER, A ;
KOIDL, P .
APPLIED PHYSICS LETTERS, 1983, 42 (08) :636-638
[12]   ANISOTROPIC ETCHING OF SIO2 IN LOW-FREQUENCY CF4/O2 AND NF3/AR PLASMAS [J].
DONNELLY, VM ;
FLAMM, DL ;
DAUTREMONTSMITH, WC ;
WERDER, DJ .
JOURNAL OF APPLIED PHYSICS, 1984, 55 (01) :242-252
[13]   OPTICAL DIAGNOSTICS OF LOW-PRESSURE PLASMAS [J].
DREYFUS, RW ;
JASINSKI, JM ;
WALKUP, RE ;
SELWYN, GS .
PURE AND APPLIED CHEMISTRY, 1985, 57 (09) :1265-1276
[14]   OPTICAL-CONSTANTS OF RF SPUTTERED HYDROGENATED AMORPHOUS SI [J].
FREEMAN, EC ;
PAUL, W .
PHYSICAL REVIEW B, 1979, 20 (02) :716-728
[15]   OPTICAL TECHNIQUES IN PLASMA DIAGNOSTICS [J].
GOTTSCHO, RA ;
MILLER, TA .
PURE AND APPLIED CHEMISTRY, 1984, 56 (02) :189-208
[16]   PLASMA-POLYMERIZED DRY-DEVELOPABLE RESIST FOR SYNCHROTRON RADIATION LITHOGRAPHY [J].
HORI, M ;
YAMADA, H ;
YONEDA, T ;
MORITA, S ;
HATTORI, S .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (03) :707-711
[17]   CRYSTALLOGRAPHIC ETCHING OF GAAS WITH BROMINE AND CHLORINE PLASMAS [J].
IBBOTSON, DE ;
FLAMM, DL ;
DONNELLY, VM .
JOURNAL OF APPLIED PHYSICS, 1983, 54 (10) :5974-5981
[18]   APPLICATION OF POLYMER-FILMS PLASMA POLYMERIZED IN THE TETRAMETHYLSILANE AMMONIA MIXTURE TO MOISTURE SENSOR [J].
INAGAKI, N ;
SUZUKI, K ;
NEJIGAKI, K .
JOURNAL OF POLYMER SCIENCE PART C-POLYMER LETTERS, 1983, 21 (05) :353-357
[19]   HYDROGEN CONTENT OF PLASMA-DEPOSITED SILICON-NITRIDE [J].
LANFORD, WA ;
RAND, MJ .
JOURNAL OF APPLIED PHYSICS, 1978, 49 (04) :2473-2477
[20]   ELECTRON-STIMULATED DESORPTION AS A TOOL FOR STUDIES OF CHEMISORPTION - REVIEW [J].
MADEY, TE ;
YATES, JT .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1971, 8 (04) :525-&