TUNABLE BARRIER HEIGHTS AND BAND DISCONTINUITIES VIA DOPING INTERFACE DIPOLES - AN INTERFACE ENGINEERING TECHNIQUE AND ITS DEVICE APPLICATIONS

被引：37

作者：

CAPASSO, F

MOHAMMED, K

CHO, AY

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1985年 / 3卷 / 04期

关键词：

D O I：

10.1116/1.583049

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1245 / 1251

页数：7

共 23 条

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