LATTICE SPACINGS OF FE FILMS DEPOSITED BY FACING TARGETS TYPE SPUTTERING

被引：13

作者：

KANEKO, T ^{[1
]}

GONG, SK ^{[1
]}

NITTONO, O ^{[1
]}

机构：

[1] TOKYO INST TECHNOL,DEPT MET ENGN,MEGURO KU,TOKYO 152,JAPAN

来源：

TRANSACTIONS OF THE JAPAN INSTITUTE OF METALS | 1986年 / 27卷 / 04期

关键词：

D O I：

10.2320/matertrans1960.27.241

中图分类号：

TF [冶金工业];

学科分类号：

0806 ;

摘要：

引用

收藏

页码：241 / 246

页数：6

相关论文

共 20 条

[1] STRESS AND RESISTIVITY CONTROL IN SPUTTERED MOLYBDENUM FILMS AND COMPARISON WITH SPUTTERED GOLD
BLACHMAN, AG
[J]. METALLURGICAL TRANSACTIONS, 1971, 2 (03): : 699 - &
[2] EFFECT OF ION-BOMBARDMENT DURING DEPOSITION ON THICK METAL AND CERAMIC DEPOSITS
BLAND, RD
KOMINIAK, GJ
MATTOX, DM
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (04): : 671 - 674
[3] RESIDUAL STRESS IN SINGLE-CRYSTAL NICKEL FILMS
FREEDMAN, JF
[J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1962, 6 (04) : 449 - 455
[4] GONG SK, UNPUB J JAPAN I META
[5] AN ELECTRON-DIFFRACTION EXAMINATION OF THIN FILMS OF LITHIUM FLUORIDE AND COPPER PREPARED BY VACUUM EVAPORATION
HALLIDAY, JS
RYMER, TB
WRIGHT, KHR
[J]. PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1954, 225 (1163): : 548 - 563
[6] INTERNAL-STRESSES IN SPUTTERED CHROMIUM
HOFFMAN, DW
THORNTON, JA
[J]. THIN SOLID FILMS, 1977, 40 (JAN) : 355 - 363
[7] COMPRESSIVE STRESS TRANSITION IN AL, V, ZR, NB AND W METAL-FILMS SPUTTERED AT LOW WORKING PRESSURES
HOFFMAN, DW
THORNTON, JA
[J]. THIN SOLID FILMS, 1977, 45 (02) : 387 - 396
[8] STRESSES IN THIN-FILMS - RELEVANCE OF GRAIN-BOUNDARIES AND IMPURITIES
HOFFMAN, RW
[J]. THIN SOLID FILMS, 1976, 34 (02) : 185 - 190
[9] HIGH-RATE DEPOSITION OF IRON FILMS BY SPUTTERING FROM 2 FACING TARGETS
HOSHI, Y
NAOE, M
YAMANAKA, S
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1977, 16 (09) : 1715 - 1716
[10] HOSHI Y, 1982, DENSHI TSUSHIN GAK C, V65, P490