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[3]
Matsuoka M., 1985, Transactions of the Institute of Electronics and Communication Engineers of Japan, Part C, VJ68C, P548
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ALUMINUM NITRIDE FILMS BY RF REACTIVE ION-PLATING
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ALN THIN-FILMS WITH CONTROLLED CRYSTALLOGRAPHIC ORIENTATIONS AND THEIR MICROSTRUCTURE
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SCHUSKUS AJ, 1974, APPL PHYS LETT, V24, P155
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INFLUENCE OF APPARATUS GEOMETRY AND DEPOSITION CONDITIONS ON STRUCTURE AND TOPOGRAPHY OF THICK SPUTTERED COATINGS
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