ALN THIN-FILMS WITH CONTROLLED CRYSTALLOGRAPHIC ORIENTATIONS AND THEIR MICROSTRUCTURE

被引：80

作者：

OHUCHI, FS ^{[1
]}

RUSSELL, PE ^{[1
]}

机构：

[1] N CAROLINA STATE UNIV,DEPT MAT SCI & ENGN,RALEIGH,NC 27695

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1987年 / 5卷 / 04期

关键词：

D O I：

10.1116/1.574579

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1630 / 1634

页数：5

共 23 条

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[7] PROTECTION OF GASAS, GAALAS AND GAASP BY ALUMINUM NITRIDE DEPOSITED BY REACTIVE SPUTTERING
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[9] IWASI N, 1986, SOLID STATE TECH OCT, P135
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