PROCESS DEPENDENT BUILDUP OF INTERFACE STATES IN IRRADIATED N-CHANNEL MOSFETS

被引:13
作者
SABNIS, AG
机构
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D O I
10.1109/TNS.1985.4334041
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页码:3905 / 3910
页数:6
相关论文
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