HYDROGEN DISTRIBUTION IN OXYNITRIDE OXIDE STRUCTURES

被引：6

作者：

ELFERINK, JBO

VANDERHEIDE, UA

BIK, WMA

HABRAKEN, FHPM

VANDERWEG, WF

机构：

来源：

APPLIED SURFACE SCIENCE | 1987年 / 30卷 / 1-4期

关键词：

D O I：

10.1016/0169-4332(87)90093-6

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：197 / 203

页数：7

共 12 条

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DENISSE, CMM ;

TROOST, KZ ;

HABRAKEN, FHPM ;

VANDERWEG, WF ;

HENDRIKS, M .

JOURNAL OF APPLIED PHYSICS, 1986, 60 (07) :2543-2547

[2]

ELFERINK JBO, 1986, SURF INTERFACE ANAL, V9, P293

[3] ENERGY-LOSS STRAGGLING OF 1.4-10 MEV/U HEAVY-IONS IN GASES [J].

GEISSEL, H ;

LAICHTER, Y ;

SCHNEIDER, WFW ;

ARMBRUSTER, P .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1983, 215 (1-2) :329-335

[4] HYDROGEN IN LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITED SILICON (OXY)NITRIDE FILMS [J].

HABRAKEN, FHPM ;

TIJHAAR, RHG ;

VANDERWEG, WF ;

KUIPER, AET ;

WILLEMSEN, MFC .

JOURNAL OF APPLIED PHYSICS, 1986, 59 (02) :447-453

[5]

HABRAKEN FHPM, 1984, P IN DEPTH REVIEW NU, P50

[6] DEPOSITION AND COMPOSITION OF SILICON OXYNITRIDE FILMS [J].

KUIPER, AET ;

KOO, SW ;

HABRAKEN, FHPM ;

TAMMINGA, Y .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (01) :62-66

[7]

MAES HE, 1983, MAY P S SIL NITR THI, P73

[8]

REMMERIE J, 1987, THESIS U LEUVEN

[9] GAP STATES IN SILICON-NITRIDE [J].

ROBERTSON, J ;

POWELL, MJ .

APPLIED PHYSICS LETTERS, 1984, 44 (04) :415-417

[10] CHEMICALLY BOUND HYDROGEN IN CVD SI3N4 - DEPENDENCE ON NH3/SIH4 RATIO AND ON ANNEALING [J].

STEIN, HJ ;

WEGENER, HAR .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (06) :908-912

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