CHEMICAL PROCESSES INVOLVED IN THE ETCHING OF SILICON BY XENON DIFLUORIDE

[1] KINETICS AND MECHANISM OF THE GAS-PHASE PYROLYSIS OF HEXAFLUORODISILANE IN THE PRESENCE OF IODINE AND SOME REACTIONS OF SILICON DIFLUORIDE [J]. JOURNAL OF THE CHEMICAL SOCIETY-FARADAY TRANSACTIONS II, 1986, 82 : 837 - 847

[2] ELECTRON-SPECTROSCOPY STUDY OF SILICON SURFACES EXPOSED TO XEF2 AND THE CHEMISORPTION OF SIF4 ON SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (05) : 2614 - 2619

[3] MPI MS DETECTION OF SIF AND SIF2 RADICALS PRODUCED FROM THE REACTION OF F2 AND NF3 WITH SILICON [J]. CHEMICAL PHYSICS LETTERS, 1987, 134 (02) : 151 - 155

[4] DIBELER VH, 1948, J RES NATL BUR STAND, V10, P25

[5] STUDIES OF CHEMI-LUMINESCENCE ACCOMPANYING FLUORINE ATOM ETCHING OF SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (10) : 5273 - 5276

[6] MULTI-PHOTON IONIZATION OF THE TRIFLUOROMETHYL RADICAL [J]. JOURNAL OF PHYSICAL CHEMISTRY, 1982, 86 (21) : 4156 - 4161

[7] DETECTION OF SIF RADICALS WITH MULTIPHOTON IONIZATION SPECTROSCOPY [J]. CHEMICAL PHYSICS LETTERS, 1985, 118 (04) : 444 - 447

[8] THE REACTION OF FLUORINE-ATOMS WITH SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (05) : 3633 - 3639

[9] PHOTOEFFECTS ON THE FLUORINATION OF SILICON .2. KINETICS OF THE INITIAL RESPONSE TO LIGHT [J]. JOURNAL OF CHEMICAL PHYSICS, 1984, 80 (10) : 4851 - 4858

[10] A REINVESTIGATION OF THE ETCH PRODUCTS OF SILICON AND XEF - DOPING AND PRESSURE EFFECTS [J]. JOURNAL OF APPLIED PHYSICS, 1986, 60 (09) : 3018 - 3027

[1] KINETICS AND MECHANISM OF THE GAS-PHASE PYROLYSIS OF HEXAFLUORODISILANE IN THE PRESENCE OF IODINE AND SOME REACTIONS OF SILICON DIFLUORIDE [J]. JOURNAL OF THE CHEMICAL SOCIETY-FARADAY TRANSACTIONS II, 1986, 82 : 837 - 847

[2] ELECTRON-SPECTROSCOPY STUDY OF SILICON SURFACES EXPOSED TO XEF2 AND THE CHEMISORPTION OF SIF4 ON SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (05) : 2614 - 2619

[3] MPI MS DETECTION OF SIF AND SIF2 RADICALS PRODUCED FROM THE REACTION OF F2 AND NF3 WITH SILICON [J]. CHEMICAL PHYSICS LETTERS, 1987, 134 (02) : 151 - 155

[4] DIBELER VH, 1948, J RES NATL BUR STAND, V10, P25

[5] STUDIES OF CHEMI-LUMINESCENCE ACCOMPANYING FLUORINE ATOM ETCHING OF SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (10) : 5273 - 5276

[6] MULTI-PHOTON IONIZATION OF THE TRIFLUOROMETHYL RADICAL [J]. JOURNAL OF PHYSICAL CHEMISTRY, 1982, 86 (21) : 4156 - 4161

[7] DETECTION OF SIF RADICALS WITH MULTIPHOTON IONIZATION SPECTROSCOPY [J]. CHEMICAL PHYSICS LETTERS, 1985, 118 (04) : 444 - 447

[8] THE REACTION OF FLUORINE-ATOMS WITH SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (05) : 3633 - 3639

[9] PHOTOEFFECTS ON THE FLUORINATION OF SILICON .2. KINETICS OF THE INITIAL RESPONSE TO LIGHT [J]. JOURNAL OF CHEMICAL PHYSICS, 1984, 80 (10) : 4851 - 4858

[10] A REINVESTIGATION OF THE ETCH PRODUCTS OF SILICON AND XEF - DOPING AND PRESSURE EFFECTS [J]. JOURNAL OF APPLIED PHYSICS, 1986, 60 (09) : 3018 - 3027