EFFECT OF DEPOSITION CONDITIONS ON INTRINSIC STRESS IN A-SI-H FILMS

被引：29

作者：

OZAWA, K

TAKAGI, N

ASAMA, K

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1983年 / 22卷 / 05期

关键词：

D O I：

10.1143/JJAP.22.767

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：767 / 770

页数：4

共 14 条

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