SURFACE MODIFICATION OF POLYMER FIBERS BY IRRADIATION WITH EXCIMER LASER .1. FUNDAMENTALS OF EXCIMER LASER TREATMENT OF POLYMERS

被引：14

作者：

BAHNERS, T

SCHOLLMEYER, E

机构：

来源：

ANGEWANDTE MAKROMOLEKULARE CHEMIE | 1987年 / 151卷

关键词：

D O I：

10.1002/apmc.1987.051510101

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

引用

页码：1 / 18

页数：18

共 26 条

[1] DIRECT ETCHING OF POLYMERIC MATERIALS USING A XECL LASER
ANDREW, JE
DYER, PE
FORSTER, D
KEY, PH
[J]. APPLIED PHYSICS LETTERS, 1983, 43 (08) : 717 - 719
[2] POLYMER FILM CUTTING AND ABLATIVE ETCHING USING A 1-KHZ XECL LASER
BISHOP, GJ
DYER, PE
[J]. APPLIED PHYSICS LETTERS, 1985, 47 (11) : 1229 - 1231
[3] EXCIMER LASER ETCHING OF POLYIMIDE
BRANNON, JH
LANKARD, JR
BAISE, AI
BURNS, F
KAUFMAN, J
[J]. JOURNAL OF APPLIED PHYSICS, 1985, 58 (05) : 2036 - 2043
[4] SPECTROSCOPIC STUDIES OF ARF LASER PHOTOABLATION OF PMMA
DAVIS, GM
GOWER, MC
FOTAKIS, C
EFTHIMIOPOULOS, T
ARGYRAKIS, P
[J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1985, 36 (01): : 27 - 30
[5] SELF-DEVELOPING UV PHOTORESIST USING EXCIMER LASER EXPOSURE
DEUTSCH, TF
GEIS, MW
[J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (12) : 7201 - 7204
[6] EXCIMER LASER ABLATION AND THERMAL COUPLING EFFICIENCY TO POLYMER-FILMS
DYER, PE
SIDHU, J
[J]. JOURNAL OF APPLIED PHYSICS, 1985, 57 (04) : 1420 - 1422
[7] MICROSCOPIC MODEL FOR THE ABLATIVE PHOTODECOMPOSITION OF POLYMERS BY FAR-ULTRAVIOLET RADIATION (193 NM)
GARRISON, BJ
SRINIVASAN, R
[J]. APPLIED PHYSICS LETTERS, 1984, 44 (09) : 849 - 851
[8] SELF-DEVELOPING RESIST WITH SUBMICROMETER RESOLUTION AND PROCESSING STABILITY
GEIS, MW
RANDALL, JN
DEUTSCH, TF
DEGRAFF, PD
KROHN, KE
STERN, LA
[J]. APPLIED PHYSICS LETTERS, 1983, 43 (01) : 74 - 76
[9] CALORIMETRIC AND ACOUSTIC STUDY OF ULTRAVIOLET-LASER ABLATION OF POLYMERS
GORODETSKY, G
KAZYAKA, TG
MELCHER, RL
SRINIVASAN, R
[J]. APPLIED PHYSICS LETTERS, 1985, 46 (09) : 828 - 830
[10] JELLINEK HHJ, 1984, J PHYS CHEM-US, V88, P3084

← 1 2 3 →