ION PROBE TECHNIQUE FOR STUDY OF GALLIUM DIFFUSION IN SILICON-NITRIDE FILMS

被引：17

作者：

LODDING, A ^{[1
]}

LUNDKVIST, L ^{[1
]}

机构：

[1] CHALMERS UNIV TECHNOL,MAT SCI CTR,40220 GOTHENBURG 5,SWEDEN

来源：

THIN SOLID FILMS | 1975年 / 25卷 / 02期

关键词：

D O I：

10.1016/0040-6090(75)90067-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：491 / 500

页数：10

相关论文

共 13 条

[1] THERMODYNAMIC APPROACH TO QUANTITATIVE INTERPRETATION OF SPUTTERED ION MASS-SPECTRA
ANDERSEN, CA
HINTHORNE, JR
[J]. ANALYTICAL CHEMISTRY, 1973, 45 (08) : 1421 - 1438
[2] RANGE DISTRIBUTION OF IMPLANTED IONS IN SIO2, SI3N4, AND AL2O3
CHU, WK
CROWDER, BL
MAYER, JW
ZIEGLER, JF
[J]. APPLIED PHYSICS LETTERS, 1973, 22 (10) : 490 - 492
[3] SILICON NITRIDE A NEW DIFFUSION MASK
DOO, VY
[J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1966, ED13 (07) : 561 - &
[4] SECONDARY ION MASS ANALYSIS - TECHNIQUE FOR 3-DIMENSIONAL CHARACTERIZATION
EVANS, CA
[J]. ANALYTICAL CHEMISTRY, 1972, 44 (13) : A67 - &
[5] GHOSHTAGORE RN, 1969, J APPL PHYS, V40, P4375
[6] A UNIVERSAL MICROSECTIONING TECHNIQUE FOR DIFFUSON
GUPTA, D
TSUI, RTC
[J]. APPLIED PHYSICS LETTERS, 1970, 17 (07) : 294 - &
[7] DIFFUSION MASKING OF SILICON NITRIDE AND SILICON OXYNITRIDE FILMS ON SI
HEUMANN, FK
BROWN, DM
METS, E
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1968, 115 (01) : 99 - &
[8] PROPERTIES OF AMORPHOUS SILICON NITRIDE FILMS
HU, SM
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1966, 113 (07) : 693 - +
[9] SELF-DIFFUSION IN SILVER AT LOW-TEMPERATURES
LAM, NQ
ROTHMAN, SJ
MEHRER, H
NOWICKI, LJ
[J]. PHYSICA STATUS SOLIDI B-BASIC RESEARCH, 1973, 57 (01): : 225 - 236
[10] LODDING A, 1974, Z NATURFORSCH A, VA 29, P897, DOI 10.1515/zna-1974-0610