SPUTTERING OF CHLORINATED SILICON SURFACES STUDIED BY SECONDARY ION MASS-SPECTROMETRY AND ION-SCATTERING SPECTROSCOPY

被引：31

作者：

BARISH, EL

VITKAVAGE, DJ

MAYER, TM

机构：

[1] Univ of North Carolina at Chapel, Hill, Dep of Chemistry, Chapel Hill,, NC, USA, Univ of North Carolina at Chapel Hill, Dep of Chemistry, Chapel Hill, NC, USA

来源：

JOURNAL OF APPLIED PHYSICS | 1985年 / 57卷 / 04期

关键词：

D O I：

10.1063/1.334536

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1336 / 1342

页数：7

共 30 条

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