INFLUENCE OF SUBSTRATE-TEMPERATURE ON THE FORMATION OF BURIED OXIDE AND SURFACE CRYSTALLINITY DURING HIGH-DOSE OXYGEN IMPLANTATION INTO SI

被引：33

作者：

HOLLAND, OW

SJOREEN, TP

FATHY, D

NARAYAN, J

机构：

来源：

APPLIED PHYSICS LETTERS | 1984年 / 45卷 / 10期

关键词：

D O I：

10.1063/1.95022

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：1081 / 1083

页数：3

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