DENSIFICATION OF THERMAL SIO2 DUE TO INTRINSIC OXIDATION STRESSING

被引：16

作者：

FARGEIX, A

GHIBAUDO, G

机构：

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1984年 / 17卷 / 11期

关键词：

D O I：

10.1088/0022-3727/17/11/020

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2331 / 2336

页数：6

共 13 条

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