ELECTRICAL-PROPERTIES OF INTRINSIC P-TYPE SHALLOW LEVELS IN HGCDTE GROWN BY MOLECULAR-BEAM EPITAXY IN THE (111)B ORIENTATION

被引:20
作者
BOUKERCHE, M
SIVANANTHAN, S
WIJEWARNASURIYA, PS
SOU, IK
FAURIE, JP
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 02期
关键词
D O I
10.1116/1.576118
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:311 / 313
页数:3
相关论文
共 9 条
[1]   ELECTRICAL-PROPERTIES OF MOLECULAR-BEAM EPITAXY PRODUCED HGCDTE LAYERS DOPED DURING GROWTH [J].
BOUKERCHE, M ;
WIJEWARNASURIYA, PS ;
RENO, J ;
SOU, IK ;
FAURIE, JP .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (04) :2072-2076
[2]   THE DOPING OF MERCURY CADMIUM TELLURIDE GROWN BY MOLECULAR-BEAM EPITAXY [J].
BOUKERCHE, M ;
WIJEWARNASURIYA, PS ;
SIVANANTHAN, S ;
SOU, IK ;
KIM, YJ ;
MAHAVADI, KK ;
FAURIE, JP .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (04) :2830-2833
[3]   INDIUM DOPING OF HGCDTE LAYERS DURING GROWTH BY MOLECULAR-BEAM EPITAXY [J].
BOUKERCHE, M ;
RENO, J ;
SOU, IK ;
HSU, C ;
FAURIE, JP .
APPLIED PHYSICS LETTERS, 1986, 48 (25) :1733-1735
[4]   ELECTRICAL-PROPERTIES OF SHALLOW LEVELS IN P-TYPE HGCDTE [J].
FINKMAN, E ;
NEMIROVSKY, Y .
JOURNAL OF APPLIED PHYSICS, 1986, 59 (04) :1205-1211
[5]  
FISHER G, 1960, HELV PHYS ACTA, V33, P463
[6]   ENERGY-GAP VERSUS ALLOY COMPOSITION AND TEMPERATURE IN HG1-XCDXTE [J].
HANSEN, GL ;
SCHMIT, JL ;
CASSELMAN, TN .
JOURNAL OF APPLIED PHYSICS, 1982, 53 (10) :7099-7101
[7]   CALCULATION OF INTRINSIC CARRIER CONCENTRATION IN HG1-XCDXTE [J].
HANSEN, GL ;
SCHMIT, JL .
JOURNAL OF APPLIED PHYSICS, 1983, 54 (03) :1639-1640
[8]   ELECTRICAL AND FAR-INFRARED OPTICAL-PROPERTIES OF P-TYPE HG-1-XCD-XTE [J].
SCOTT, W ;
STELZER, EL ;
HAGER, RJ .
JOURNAL OF APPLIED PHYSICS, 1976, 47 (04) :1408-1414
[9]   NEW ACHIEVEMENTS IN HG1-XCDXTE GROWN BY MOLECULAR-BEAM EPITAXY [J].
SIVANANTHAN, S ;
LANGE, MD ;
MONFROY, G ;
FAURIE, JP .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (02) :788-793