FACTORS INFLUENCING THE PHOTOLUMINESCENCE INTENSITY OF INP

被引:5
作者
LESTER, SD
KIM, TS
STREETMAN, BG
机构
关键词
D O I
10.1149/1.2108372
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
收藏
页码:2208 / 2209
页数:2
相关论文
共 10 条
[1]   RECOMBINATION AT SEMICONDUCTOR SURFACES AND INTERFACES [J].
ASPNES, DE .
SURFACE SCIENCE, 1983, 132 (1-3) :406-421
[2]   LUMINESCENCE STUDY OF RAPID LAMP ANNEALING OF SI-IMPLANTED INP [J].
KIRILLOV, D ;
MERZ, JL ;
KALISH, R ;
SHATAS, S .
JOURNAL OF APPLIED PHYSICS, 1985, 57 (02) :531-536
[3]   PROCESSING OF INP MIS DEVICES MONITORED VIA PHOTOLUMINESCENCE MEASUREMENTS [J].
KRAWCZYK, S ;
BAILLY, B ;
SAUTREUIL, B ;
BLANCHET, R ;
VIKTOROVITCH, P .
ELECTRONICS LETTERS, 1984, 20 (06) :255-256
[4]   PHOTOLUMINESCENCE AND X-RAY PHOTOELECTRON-SPECTROSCOPY MEASUREMENTS OF INP SURFACE TREATED BY ACID AND BASE SOLUTIONS [J].
KRAWCZYK, SK ;
HOLLINGER, G .
APPLIED PHYSICS LETTERS, 1984, 45 (08) :870-872
[5]  
LESTER SD, UNPUB
[6]   AMBIENT GAS INFLUENCE ON PHOTO-LUMINESCENCE INTENSITY FROM INP AND GAAS CLEAVED SURFACES [J].
NAGAI, H ;
NOGUCHI, Y .
APPLIED PHYSICS LETTERS, 1978, 33 (04) :312-314
[7]   PROPERTIES OF AMBIENT-ENHANCED PHOTO-LUMINESCENCE FROM INP AND GAAS-SURFACES [J].
NAGAI, H ;
TOHNO, S ;
MIZUSHIMA, Y .
JOURNAL OF APPLIED PHYSICS, 1979, 50 (08) :5446-5448
[8]   SURFACE-TREATMENT EFFECT ON PHOTO-LUMINESCENCE OF INP [J].
NAGAI, H ;
NOGUCHI, Y .
JOURNAL OF APPLIED PHYSICS, 1979, 50 (03) :1544-1545
[9]   UNPINNED (100) GAAS-SURFACES IN AIR USING PHOTOCHEMISTRY [J].
OFFSEY, SD ;
WOODALL, JM ;
WARREN, AC ;
KIRCHNER, PD ;
CHAPPELL, TI ;
PETTIT, GD .
APPLIED PHYSICS LETTERS, 1986, 48 (07) :475-477
[10]   PHOTO-LUMINESCENT PROPERTIES OF GAAS-GAALAS, GAAS-OXIDE, AND GAAS-ZNS HETEROJUNCTIONS [J].
WOODALL, JM ;
PETTIT, GD ;
CHAPPELL, T ;
HOVEL, HJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (05) :1389-1393