TWO-DIMENSIONAL PROCESS MODELING - A DESCRIPTION OF THE SAFEPRO PROGRAM

被引：21

作者：

OBRIEN, RR

HSIEH, CM

MOORE, JS

LEVER, RF

MURLEY, PC

BRANNON, KW

SRINIVASAN, GR

KNEPPER, RW

机构：

[1] IBM, Computer Aided Device Design, Dep, Hopewell Junction, NY, USA, IBM, Computer Aided Device Design Dep, Hopewell Junction, NY, USA

来源：

IBM JOURNAL OF RESEARCH AND DEVELOPMENT | 1985年 / 29卷 / 03期

关键词：

D O I：

10.1147/rd.293.0229

中图分类号：

TP3 [计算技术、计算机技术];

学科分类号：

0812 ;

摘要：

引用

页码：229 / 241

页数：13

共 21 条

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[15] ADVANCED BIPOLAR-TRANSISTOR MODELING - PROCESS AND DEVICE SIMULATION TOOLS FOR TODAYS TECHNOLOGY [J].

KNEPPER, RW ;

GAUR, SP ;

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SRINIVASAN, GR .

IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1985, 29 (03) :218-228

[16]

Lindhard J., 1963, MAT FYS MEDD DAN VID, V33, P1, DOI DOI 10.1002/ADMA.200904153

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[19] ARSENIC CLUSTERING IN SILICON [J].

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[20]

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