RELATIONSHIP BETWEEN SHORT CHANNEL BEHAVIOR AND LONG-TERM STABILITY OF N-CHANNEL ENHANCEMENT AND DEPLETION MOSFETS

被引:2
作者
BAUER, F
BALK, P
机构
关键词
D O I
10.1016/0038-1101(86)90182-6
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:797 / 806
页数:10
相关论文
共 47 条
[1]  
Aslam M., 1983, Insulating Films on Semiconductors. Proceedings of the International Conference INFOS 83, P103
[2]   GENERALIZED SCALING THEORY AND ITS APPLICATION TO A 1/4 MICROMETER MOSFET DESIGN [J].
BACCARANI, G ;
WORDEMAN, MR ;
DENNARD, RH .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1984, 31 (04) :452-462
[3]   POSITIVE AND NEGATIVE CHARGE GENERATION BY HOT CARRIERS IN N-MOSFETS [J].
BORCHERT, B ;
HOFMANN, KR ;
DORDA, G .
ELECTRONICS LETTERS, 1983, 19 (18) :746-747
[4]  
BREWS JR, 1981, APPLIED SOLID STAT A, P1
[5]  
Chatterjee P. K., 1980, IEEE Electron Device Letters, VEDL-1, P220, DOI 10.1109/EDL.1980.25295
[6]   HOT-ELECTRON EMISSION IN N-CHANNEL IGFETS [J].
COTTRELL, PE ;
TROUTMAN, RR ;
NING, TH .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1979, 26 (04) :520-533
[7]   HOLE TRAPPING IN THE BULK OF SIO2 LAYERS AT ROOM-TEMPERATURE [J].
DEKEERSMAECKER, RF ;
DIMARIA, DJ .
JOURNAL OF APPLIED PHYSICS, 1980, 51 (01) :532-539
[8]   DESIGN OF ION-IMPLANTED MOSFETS WITH VERY SMALL PHYSICAL DIMENSIONS [J].
DENNARD, RH ;
GAENSSLEN, FH ;
YU, HN ;
RIDEOUT, VL ;
BASSOUS, E ;
LEBLANC, AR .
IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1974, SC 9 (05) :256-268
[9]  
DiMaria D.J., 1978, PHYS SIO2 ITS INTERF, P160, DOI [10.1016/B978-0-08-023049-8.50034-8, DOI 10.1016/B978-0-08-023049-8.50034-8]
[10]   HOT-ELECTRON INJECTION INTO THE OXIDE IN N-CHANNEL MOS DEVICES [J].
EITAN, B ;
FROHMANBENTCHKOWSKY, D .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1981, 28 (03) :328-340