MOCVD GROWTH OF CDTE AND HGCDTE

被引：26

作者：

SCHMIT, JL

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1985年 / 3卷 / 01期

关键词：

D O I：

10.1116/1.573252

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：89 / 92

页数：4

共 11 条

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[6]

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[9] THE GROWTH OF CDXHG1-XTE USING ORGANOMETALLICS [J].

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