INFLUENCE OF ENERGETIC OXYGEN BOMBARDMENT ON CONDUCTIVE ZNO FILMS

[1] Azaroff L.V., 1968, ELEMENTS XRAY CRYSTA, P552

[2] TRANSPARENT AND HIGHLY CONDUCTIVE FILMS OF ZNO PREPARED BY RF SPUTTERING [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1983, 22 (04): : L245 - L247

[3] CONTROLLED TEXTURE OF REACTIVELY RF-SPUTTERED ZNO THIN-FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1978, 49 (05) : 2787 - 2792

[4] HIGHLY CONDUCTIVE AND TRANSPARENT ZINC-OXIDE FILMS PREPARED BY RF MAGNETRON SPUTTERING UNDER AN APPLIED EXTERNAL MAGNETIC-FIELD [J]. APPLIED PHYSICS LETTERS, 1982, 41 (10) : 958 - 960

[5] Nakazawa T., 1983, Journal of the Vacuum Society of Japan, V26, P889, DOI 10.3131/jvsj.26.889

[6] ELECTRICAL AND OPTICAL-PROPERTIES OF ZINC-OXIDE THIN-FILMS PREPARED BY RF MAGNETRON SPUTTERING FOR TRANSPARENT ELECTRODE APPLICATIONS [J]. JOURNAL OF APPLIED PHYSICS, 1984, 55 (04) : 1029 - 1034

[7] HIGHLY ORIENTED ZNO FILMS BY RF SPUTTERING OF HEMISPHERICAL ELECTRODE SYSTEM [J]. JOURNAL OF APPLIED PHYSICS, 1976, 47 (04) : 1726 - 1728

[8] RELATIONSHIP BETWEEN CORRECTION FACTOR OF 4-POINT PROBE VALUE AND SELECTION OF POTENTIAL AND CURRENT ELECTRODES [J]. JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1969, 2 (02): : 170 - +

[9] ENERGY ANALYSIS OF HIGH-ENERGY NEUTRAL ATOMS IN THE SPUTTERING OF ZNO AND BATIO3 [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1982, 21 (05): : 688 - 695

[10] HIGH-ENERGY NEUTRAL ATOMS IN THE SPUTTERING OF ZNO [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1981, 20 (03) : 519 - 526

[1] Azaroff L.V., 1968, ELEMENTS XRAY CRYSTA, P552

[2] TRANSPARENT AND HIGHLY CONDUCTIVE FILMS OF ZNO PREPARED BY RF SPUTTERING [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1983, 22 (04): : L245 - L247

[3] CONTROLLED TEXTURE OF REACTIVELY RF-SPUTTERED ZNO THIN-FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1978, 49 (05) : 2787 - 2792

[4] HIGHLY CONDUCTIVE AND TRANSPARENT ZINC-OXIDE FILMS PREPARED BY RF MAGNETRON SPUTTERING UNDER AN APPLIED EXTERNAL MAGNETIC-FIELD [J]. APPLIED PHYSICS LETTERS, 1982, 41 (10) : 958 - 960

[5] Nakazawa T., 1983, Journal of the Vacuum Society of Japan, V26, P889, DOI 10.3131/jvsj.26.889

[6] ELECTRICAL AND OPTICAL-PROPERTIES OF ZINC-OXIDE THIN-FILMS PREPARED BY RF MAGNETRON SPUTTERING FOR TRANSPARENT ELECTRODE APPLICATIONS [J]. JOURNAL OF APPLIED PHYSICS, 1984, 55 (04) : 1029 - 1034

[7] HIGHLY ORIENTED ZNO FILMS BY RF SPUTTERING OF HEMISPHERICAL ELECTRODE SYSTEM [J]. JOURNAL OF APPLIED PHYSICS, 1976, 47 (04) : 1726 - 1728

[8] RELATIONSHIP BETWEEN CORRECTION FACTOR OF 4-POINT PROBE VALUE AND SELECTION OF POTENTIAL AND CURRENT ELECTRODES [J]. JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1969, 2 (02): : 170 - +

[9] ENERGY ANALYSIS OF HIGH-ENERGY NEUTRAL ATOMS IN THE SPUTTERING OF ZNO AND BATIO3 [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1982, 21 (05): : 688 - 695

[10] HIGH-ENERGY NEUTRAL ATOMS IN THE SPUTTERING OF ZNO [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1981, 20 (03) : 519 - 526