INSITU STRESS MEASUREMENT OF REFRACTORY-METAL SILICIDES DURING SINTERING

被引：95

作者：

PAN, JT

BLECH, I

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1984年 / 55卷 / 08期

关键词：

D O I：

10.1063/1.333326

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2874 / 2880

页数：7

共 8 条

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[6] REFRACTORY SILICIDES FOR INTEGRATED-CIRCUITS [J].

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[7] ELASTIC STIFFNESS AND THERMAL-EXPANSION COEFFICIENTS OF VARIOUS REFRACTORY SILICIDES AND SILICON-NITRIDE FILMS [J].

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[8]

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