MODELING PHYSICAL LIMITATIONS ON JUNCTION SCALING FOR CMOS

被引:4
作者
FAIR, RB [1 ]
WORTMAN, JJ [1 ]
LIU, J [1 ]
TISCHLER, M [1 ]
MASNARI, NA [1 ]
机构
[1] N CAROLINA STATE UNIV,DEPT ELECT ENGN,RALEIGH,NC 27650
关键词
D O I
10.1109/T-ED.1984.21685
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:1180 / 1185
页数:6
相关论文
共 19 条
[1]   DIFFUSION OF SUBSTITUTIONAL IMPURITIES IN SILICON AT SHORT OXIDATION TIMES - AN INSIGHT INTO POINT-DEFECT KINETICS [J].
ANTONIADIS, DA ;
MOSKOWITZ, I .
JOURNAL OF APPLIED PHYSICS, 1982, 53 (10) :6788-6796
[3]   DIFFUSION OF ION-IMPLANTED-B IN HIGH-CONCENTRATION P-DOPED AND AS-DOPED SILICON [J].
FAIR, RB ;
PAPPAS, PN .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (09) :1241-1244
[4]   QUANTITATIVE THEORY OF RETARDED BASE DIFFUSION IN SILICON N-P-N STRUCTURES WITH ARSENIC EMITTERS [J].
FAIR, RB .
JOURNAL OF APPLIED PHYSICS, 1973, 44 (01) :283-291
[5]  
FAIR RB, 1982, SEMICONDUCTOR SILICO, P963
[6]  
FAIR RB, 1981, APPLIED SOLID STAT B, V2, P1
[7]  
FAIR RB, UNPUB
[8]  
FICHTNER W, 1981, ELECTROCHEMICAL SOC
[9]   FORMATION OF STACKING-FAULTS AND ENHANCED DIFFUSION IN OXIDATION OF SILICON [J].
HU, SM .
JOURNAL OF APPLIED PHYSICS, 1974, 45 (04) :1567-1573
[10]   APPROXIMATE THEORY OF EMITTER-PUSH EFFECT [J].
HU, SM ;
YEH, TH .
JOURNAL OF APPLIED PHYSICS, 1969, 40 (11) :4615-&