MODIFICATIONS IN THE UNIT-CELL GEOMETRY OF SPUTTERED NIOBIUM FILMS CAUSED BY HIGH-ENERGY ION-BOMBARDMENT

被引：2

作者：

PEASE, DM

NAMAVAR, F

BUDNICK, J

CHOI, M

GROEGER, J

OTTER, FA

BRUYNSERAEDE, Y

CLAPP, M

机构：

[1] UNITED TECHNOL RES CTR,E HARTFORD,CT 06108

[2] CATHOLIC UNIV LEUVEN,B-3000 LOUVAIN,BELGIUM

[3] UNIV MASSACHUSETTS,AMHERST,MA 01002

[4] UNIV CONNECTICUT,INST MAT SCI,STORRS,CT 06268

来源：

THIN SOLID FILMS | 1984年 / 120卷 / 03期

关键词：

D O I：

10.1016/0040-6090(84)90300-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：239 / 247

页数：9

共 15 条

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