ATOMIC-SCALE MECHANISMS FOR SURFACTANT-MEDIATED LAYER-BY-LAYER GROWTH IN HOMOEPITAXY

被引:136
作者
ZHANG, ZY
LAGALLY, MG
机构
[1] University of Wisconsin, Madison
关键词
D O I
10.1103/PhysRevLett.72.693
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Atomic-scale mechanisms for surfactant-mediated layer-by-layer growth in homoepitaxy are investigated theoretically. Starting with minimal assumptions on relative bond strengths, we demonstrate that four possible mechanisms can be operative in enhancing layered growth: (1) a high density of islands at the initial growth stage of each layer, (2) a reduced activation barrier for atoms to cross steps, (3) incorporation into a growing island, and (4) an effective increase in the migration rate on top of the island. We assess the relative importance of these processes by computer simulations.
引用
收藏
页码:693 / 696
页数:4
相关论文
共 18 条
  • [1] [Anonymous], ENCY BRITTANICA
  • [2] SURFACTANTS IN EPITAXIAL-GROWTH
    COPEL, M
    REUTER, MC
    KAXIRAS, E
    TROMP, RM
    [J]. PHYSICAL REVIEW LETTERS, 1989, 63 (06) : 632 - 635
  • [3] GROWTH-MORPHOLOGY AND THE EQUILIBRIUM SHAPE - THE ROLE OF SURFACTANTS IN GE/SI ISLAND FORMATION
    EAGLESHAM, DJ
    UNTERWALD, FC
    JACOBSON, DC
    [J]. PHYSICAL REVIEW LETTERS, 1993, 70 (07) : 966 - 969
  • [4] ESCH S, IN PRESS
  • [5] Feibelman P. J., 1993, Comments on Condensed Matter Physics, V16, P191
  • [6] REALIZATION OF ABRUPT INTERFACES IN SI/GE SUPERLATTICES BY SUPPRESSING GE SURFACE SEGREGATION WITH SUBMONOLAYER OF SB
    FUJITA, K
    FUKATSU, S
    YAGUCHI, H
    IGARASHI, T
    SHIRAKI, Y
    ITO, R
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1990, 29 (11): : L1981 - L1983
  • [7] DIRECT IMAGING OF INTERFACIAL ORDERING IN ULTRATHIN (SIMGEN)P SUPERLATTICES
    JESSON, DE
    PENNYCOOK, SJ
    BARIBEAU, JM
    [J]. PHYSICAL REVIEW LETTERS, 1991, 66 (06) : 750 - 753
  • [8] INTERPLAY OF STRAIN AND CHEMICAL BONDING IN SURFACTANT MONOLAYERS
    KAXIRAS, E
    [J]. EUROPHYSICS LETTERS, 1993, 21 (06): : 685 - 690
  • [9] REENTRANT LAYER-BY-LAYER GROWTH DURING MOLECULAR-BEAM EPITAXY OF METAL-ON-METAL SUBSTRATES
    KUNKEL, R
    POELSEMA, B
    VERHEIJ, LK
    COMSA, G
    [J]. PHYSICAL REVIEW LETTERS, 1990, 65 (06) : 733 - 736
  • [10] SURFACE SELF-DIFFUSION OF SI ON SI(001)
    MO, YW
    KLEINER, J
    WEBB, MB
    LAGALLY, MG
    [J]. SURFACE SCIENCE, 1992, 268 (1-3) : 275 - 295