CONTACT RESISTANCE OF AL/SI OHMIC ELECTRODES FORMED BY RAPID LAMP SINTERING

被引：11

作者：

HARA, T ^{[1
]}

SUZUKI, H ^{[1
]}

FURUKAWA, M ^{[1
]}

AMEMIYA, K ^{[1
]}

机构：

[1] PIONEER CO LTD,SEMICOND RES LAB,KOFU 660,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1983年 / 22卷 / 06期

关键词：

D O I：

10.1143/JJAP.22.L340

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：L340 / L342

页数：3

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