ON THE MECHANISMS OF LATERAL SOLID-PHASE EPITAXIAL-GROWTH OF AMORPHOUS SI FILMS EVAPORATED ON SIO2 PATTERNS

被引：32

作者：

YAMAMOTO, H

ISHIWARA, H

FURUKAWA, S

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1985年 / 24卷 / 04期

关键词：

D O I：

10.1143/JJAP.24.411

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：411 / 415

页数：5

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