REGULARITIES OF GROWTH AND ELECTRICAL-PROPERTIES IN THE PLASMA-ENHANCED DEPOSITION OF SILICON-NITRIDE

被引:2
作者
ALEKSANDROV, LN
BELOUSOV, II
EFIMOV, VM
机构
[1] Acad of Sciences of the USSR, Novosibirsk, USSR, Acad of Sciences of the USSR, Novosibirsk, USSR
关键词
D O I
10.1016/0040-6090(88)90014-4
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
11
引用
收藏
页码:337 / 343
页数:7
相关论文
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