GOLD DIFFUSION IN CHEMICAL-VAPOR-DEPOSITED AMORPHOUS-SILICON

被引：28

作者：

CALCAGNO, L

CAMPISANO, SU

COFFA, S

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 66卷 / 04期

关键词：

D O I：

10.1063/1.344491

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1874 / 1876

页数：3

共 8 条

[1]

COFFA S, 1988, J APPL PHYS, V68, P6291

[2] DIFFUSION AND PRECIPITATION IN AMORPHOUS SI [J].

ELLIMAN, RG ;

GIBSON, JM ;

JACOBSON, DC ;

POATE, JM ;

WILLIAMS, JS .

APPLIED PHYSICS LETTERS, 1985, 46 (05) :478-480

[3] MECHANISM OF DIFFUSION OF COPPER IN GERMANIUM [J].

FRANK, FC ;

TURNBULL, D .

PHYSICAL REVIEW, 1956, 104 (03) :617-618

[4] DIFFUSION OF GOLD IN SILICON - A NEW MODEL [J].

GOSELE, U ;

MOREHEAD, F ;

FRANK, W ;

SEEGER, A .

APPLIED PHYSICS LETTERS, 1981, 38 (03) :157-159

[5]

GOSELE U, 1980, APPL PHYS, V23, P360

[6] DIFFUSION OF IMPLANTED IMPURITIES IN AMORPHOUS SI [J].

POATE, JM ;

JACOBSON, DC ;

WILLIAMS, JS ;

ELLIMAN, RG ;

BOERMA, DO .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1987, 19-20 :480-483

[7] DIFFUSION OF GOLD IN DISLOCATION-FREE OR HIGHLY DISLOCATED SILICON MEASURED BY THE SPREADING-RESISTANCE TECHNIQUE [J].

STOLWIJK, NA ;

HOLZL, J ;

FRANK, W ;

WEBER, ER ;

MEHRER, H .

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1986, 39 (01) :37-48

[8] MECHANISM OF GOLD DIFFUSION INTO SILICON [J].

WILCOX, WR ;

LACHAPELLE, TJ .

JOURNAL OF APPLIED PHYSICS, 1964, 35 (01) :240-&

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